News & Events

In 2018-9, USTC had successfully organized the International Workshop of Synchrotron Radiation Spectroscopies for Energy Related Materials. Closed to 100 participants were joint from different countries in the world. USTC is very popular organization with one of the very few Synchrotron Radiation facilities in the world. Over the years, USTC Synchrotron Radiation lab had helped in the various research field with a lot of valuable contribution.   In this event, PHI China / CoreTech Integrated Limited had been invited to join as one of the sponsor company. We have also been given a chance that for our executive director Mr. Wensly Yip to present the newest Hard X-ray Photo-electron Spectroscopy instrument, named PHI Quantes, during the workshop.   The PHI Quantes, which utilize a Cr hard X-ray at an X-ray energy of 5414.9eV, is able to provide 3 times deeper information than the more common commercial XPS instrument which usually uses the Al K-Alpha X-ray (energy 1486.6eV). Other than that, PHI Quantes provided Cr hard X-ray is capable to be focus down to tens of micron range while also able to scan over a selected area. This provides some very interesting idea into the XPS analysis for our future technologies development.   PHI China / CoreTech Integrated Limited would like to congratulate to USTC and Professor Zhu JunFa for the very successful workshop, and wish we will have more and more opportunities to work with USTC in the future.     Group photo taken at USTC workshop

CMRS (China Material Research Society) exhibition had held in 2018-7 in the beautiful city of Xiamen, China. During the exhibition, hundreds of company participated in the exhibition booth to show their newest technologies in applications of different materials.   PHI China / CoreTech Integrated Limited had joint into the event as one of the supplier, in representing Surface Analysis technologies field. There was also a poster section in this exhibition, and surprisingly there are over 40 posters had utilized some part of surface analysis techniques such as XPS (X-ray Photo-electron Spectroscopy) or AES (Auger Electron Spectroscopy) to characterize some materials property hence in-help for research or product development purposes.   In this year, it has already been the 4th consecutive year that for PHI China to participate in this event. Our executive director, Mr. Wensly Yip, had a chance to present a talk during this time exhibition on the topic of “New material characterization method by Tandem Tof-SIMS analysis” which is another important technique in surface analysis field. Mr. Wensly Yip had explained how the tandem MS approach had given a completely different concept for the Tof-SIMS analysis. In ordinary Tof-SIMS, it already has the advantages such as being able to detect Hydrogen, very high detection limit until the ppm to ppb level, very fast parallel detection and also the sub-micron spatial resolution capabilities. Then the new tandem MS function added had dramatically help Tof-SIMS to be able to distinguish peaks in the high mass range (>200amu) with complete confidence.   PHI China / CoreTech Integrated Limited will always have the full dedication into the China market and target to provide the best surface analysis instrument and the after-sale service to all the users. We hope CMRS will continue its success while we would be proud to keep being part of the exhibition in every year.   Mr. Wensly Yip taken a photo at the CMRS exhibition at Xiamen   Discussion after the presentation with answering questions by Mr. Wensly Yip   Mr. Wensly Yip presented the topic “New material characterization method by Tandem Tof-SIMS analysis

The second Shenzhen Tsinghua University Seminar was successfully held in the Lecture Hall of Shenzhen Tsinghua University Graduate School from 22nd to 23rd March this year. This seminar is mainly organized by the Graduate School of Shenzhen Tsinghua University and co-organized by ULVAC-PHI and PHI (China) Limited. There were around 200 participants who have joined the Open house. The participants were not only from the teachers and students of Tsinghua University Graduate School, but also some surface analysis experts from other districts in China.   The seminar format was the same with last year. Shenzhen Tsinghua University Seminar was like a combination of ‘Seminar’ and ‘Training’. In the seminar part, Scientist of ULVAC-PHI Dr. Chang Hsunyun, Specialist of ULVAC-PHI, Mr. Urushihara Nobuaki and Professor Shue from Taiwan Academia Sinica were the guests to present the latest techniques and applications of surface analysis in order to let the participants to have deeper understandings on the information and applicable areas of surface analysis instruments. For the training part, Executive Director of PHI (China) Mr. Wensly Yip was another guest to have a sharing on the data analysis of new technique on MSMS Tof. He also talked about new surface analysis technique and applications. Besides, Professor Zhang and Mr. Yip have provided technical consultations to all the participants. Both of them have explained and presented the functions and characteristics of XPS and MSMS to the experts and professors. They answered their questions one by one and enhanced the understandings in XPS and MSMS in terms of the wide range of possible applications.   Registration area at the seminar   Executive Director of PHI (China) Mr. Wensly Yip had given a talk to the audiences   Group photo  

ULVAC-PHI surface analysis users meeting was successfully held in Shantou University on 10th August, 2017. There were a lot of participants such as professors, experts and students who have joined the user meeting.   Before the conference started, Executive Director of PHI (China) Mr. Wensly Yip has given a speech to welcome all our users to be gathered again at the same time every year. This is a great platform for all users to discuss the development and the latest application of XPS. After that, comprehensive presentations about XPS powder microanalysis have been made. All users were satisfied with the presentations’ results. Apart from that, Professor Shyue from Taiwan Academia Sinica has given a speech on Ion gun co-sputtering XPS Applications X. That was a great presentation and academic investigation.   One of the guests, ULVAC-PHI Asia Marketing Manager Mr. Takuji Shibasaki has given a presentation on how to use ULVAC-PHI Ellipsometer in a better way. He had made a very comprehensive introduction and description on this topic. Another guest, ULVAC-PHI scientist Dr. Zhang has given a presentation on Tof-SIMS latest application of materials and done a very comprehensive elaboration on this topic. She even shared some data processing skills of XPS and AES. The guests discussed a lot with all our users in the conference.   Thank you for all the support and participation from the guests and participants. We hope to build up a strong network and platform to gather all the users. It could be a great opportunity for them to share their analysis techniques and have better communication. It is good for us to have a better result in the field of science and technology.   Executive Director of PHI (China) Mr. Wensly Yip had given a talk to the audiences   ULVAC-PHI Asia Marketing Manager Mr. Takuji Shibasaki had given a talk to the audiences   Scientist of ULVAC-PHI Dr. Chang Hsunyun had given a talk to the audiences

(This page is in Chinese only.  For details, please kindly contact our representative.)   致各位老师、专家和单位人员：   首先，诚挚地感谢各位一直以来对PHI的信任与支持！正是得益于来自各方的提携和帮助，PHI中国的业务才得以不断发展与壮大。一路走来，感谢有您！   PHI 在中国的业务发展过程中一直秉承着“让中国用户享受到全球一流的表面分析技术专业服务”这一理念。PHI不仅为中国用户带来了世界一流的产品和技术，更持续致力于促进用户间技术交流与提升，分享推广最佳实践成果，优化解决方案，从而使得PHI表面分析产品的用户不仅在售后服务上免除了后顾之忧，更能享受到一流的应用技术支持、培训交流、行业互动等增值服务。由PHI发起的表面分析应用与技术用户会议正是PHI全力打造的这样一个交流平台。   继2016年成功重新举办用户会议以来，该会议得到了与会各方的好评，取得了良好的用户反馈。在此，我们诚邀PHI的各位新老客户莅临高德公司和ULVAC-PHI公司在汕头共同举办的“ULVAC-PHI 表面分析应用与技术用户会议”（2017年8月10日，中国汕头大学）。本次会议将继续为原厂、用户和学校及科研机构搭建技术交流和共享平台。   现就本次会议的相关安排通知如下：   一、会议形式及内容 • 仪器使用和数据处理培训班 • ULVAC-PHI 表面分析技术最新发展和应用   二、重要时间、地点和会议安排   2017年8月09日 - 全天报到 报到地点: 汕头大学学术交流服务中心 (ACC)   2017年8月10日   ULVAC-PHI 表面分析应用与技术用户会议 2016年8月10日 - 9:00am – 9:15am  -  会议开幕致辞  9:15am – 9:45am  -  PHI XPS粉末微区分析表侦上的突破  9:45am – 10:15am  -  IPES 反光电子能谱和UPS联用的应用  10:15am – 10:40am  -  茶歇  10:40am – 11:10am  -  ULVAC-PHI Ellipsometer 椭偏仪  11:10am – 11:40am   -  Tof-SIMS 最新材料应用  11:40am – 12:00pm  -  ULVAC-PHI 仪器多种联用  12:00pm – 13:30pm  -  午餐时间  13:30pm – 15:00pm  -  XPS和AES数据处理技巧  15:00pm – 17:30pm  -  用户讨论时间           18:30pm          -  晚宴   三、会议收费 和 住宿安排 会议参会免费,并招待用餐。住宿建议安排于汕头大学学术交流服务中心(ACC)或汕头大学专家公寓, 住宿费用自理。如需帮忙订房,请与我们联系。          (1) 汕头大学学术交流服务中心(ACC)        Administrative Department, Shantou University Academic Conference Centre        标准间（双床）：441元(不含早)         标准间（大床）：441元(不含早)         豪华大床房：476元（不含早）        联系电话Tel：0754-82905103        邮箱Email：stuacc@stu.edu.cn        地址Add：中国广东省汕头市大学路243号          (2) 汕头大学专家公寓        双人间：160元（不含早）        联系电话Tel：0754-86503146        邮箱Email：zjgy1@stu.edu.cn   五、联系方式                                联系人：凌媚（手机 186 1249 8200，邮箱 may.ling@coretechint.com） 潘剑南（手机 186 1230 078，邮箱 nice.pan@coretechint.com)林文俊（邮箱 michael.lam@coretechint.com) 公司电话：010-62519668 公司传真：010-62513509   欢迎各位老师、专家和单位人员，报名参会。 附件一：《高德公司 邀请函》附件二：《报名表》 请将填妥报名报发送至michael.lam@coretechint.com。   2017年8月11~13日 将为在汕头大学汕头检验检测学会承办的2017全国表面分析科学与技术应用学术会议。ULVAC-PHI和高德公司将继续全程参与，也诚邀各位老师和专家们一同共襄盛举。   高德英特（北京）科技有限公司 ULVAC-PHI Incorporated

(This page is in Chinese only.  For details, please kindly contact our representative.)   “2017年5月18日，由清华大学材料中心主办、ULVAC-PHI与PHI （China）高德英特公司共同协办的“表面分析技术俄歇电子能谱仪应用研讨会暨培训班”在清华大学成功举办。此次活动吸引了来自清华大学的师生及国内各高校相关专业的多位老师与专家。   此次培训班以研讨会与培训+实验室参观演示的模式进行。 在研讨会上，ULVAC-PHI原厂科学家张熏匀博士作为特邀嘉宾，为参会人员介绍了俄歇电子能谱仪（AES）的原理及应用范围；来自PHI（China）的执行总监叶上远先生则为参会人员介绍了扫描俄歇纳米探针（PHI710）的功能及特点，让参会者更深刻地了解在材料分析研究中如何最有效的利用俄歇电子能谱仪（PHI710）实现材料分析测试；此外，EBSD公司也在会上介绍了EBSD应用。   “PHI（China）的执行总监叶上远先生在下午的培训课中进行了MultiPak的演示，并就参会者提出的相关问题进行了一一解答。 提问答疑结束后，作为此次活动的收官环节，PHI（China）的主任工程师辛国强先生带领参会者参观了清华大学材料学院实验室的扫描俄歇纳米探针（PHI710）并进行了现场演示实验。   作为中国表面分析市场的领军企业，PHI在中国区业务拓展过程中一直在不断探索如何让中国用户享受到全球一流的表面分析技术专业服务。从用户角度出发，切实加强售后服务和用户体验，正是PHI一直秉持的理念。在这一理念的引导下，PHI不断加大售后及运营管理方面的投入，此次活动即是PHI践行该理念的系列举措之一。PHI旨在通过这样的活动和投入，使得购买PHI产品的用户不仅在售后服务上免除了后顾之忧，更能够享受到一流的技术支持、培训交流、行业互动等产品以外的增值服务。PHI将继续致力于促进用户间技术交流与提升，分享推广最佳实践成果，优化解决方案，为中国表面分析行业的发展竭诚尽智！   2017年5月18日，清华大学材料中心会议室，由陶琨老师做简短的会议致辞。   叶上远（Wensly.Yip）总监致辞   EDAX中国公司应用专家严琴舫介绍EBSD的功能和应用   ULVAC-PHI 亚洲区销售经理 Mr. Takuji Shibasaki 柴崎琢自 致词   叶上远（Wensly.Yip）在做MultiPak的演示   辛国强（PHI-China主任工程师）带领与会者实验室参观、演示PHI710

The 14th China International Scientific Instruments and Laboratory Equipment Exhibition (ESEE) was successfully held in Nanjing International Exhibition Center from 14th April to 16th April this year.   PHI (China) had joined the conference to display and introduce the instruments such as TOF-SIMS, AES and XPS. It successfully aroused the audiences’ interests and awareness. The technicians from PHI (China) have explained the functions and characteristics of the instruments to the audiences such as instruments users, teachers and experts one by one. It could clean up their confusion and let them to have better understandings on the instruments. This was a golden chance for us to have a better understanding on customer’s needs.   Exhibition venue of ESEE   PHI (China) sets up a booth at the exhibition    Executive Director of PHI (China) Mr. Wensly Yip explained the functions and characteristics of the instruments

China International Scientific Instrument and Laboratory Equipment Exhibition (CISILE) was successfully held in China National Convention Center from 6th April to 8th April this year.   CISILE 2017 has not only attracted the international enterprises from more than 20 countries and regions, but also some teachers and students from the local universities to join the exhibition. PHI (China) had joined the conference to display and introduce the instruments such as TOF-SIMS, AES and XPS. It successfully aroused the audiences’ interests and awareness. The technicians from PHI (China) have explained the functions and characteristics of the instruments to the audiences one by one. It could clean up the audiences’ confusion and let them to have better understandings on the instruments. This made an excellent atmosphere with good display, communication and interaction.   This is a golden opportunity to let PHI (China) to be one of the exhibitors this year. This international conference is a great learning platform for us to communicate and interact with different experts, professors and students. PHI (China) was so glad to present the latest instruments and raise the awareness from the public. This was successfully to let more audiences to know about wide range of application of TOF-SIMS, AES and XPS.   Exhibition venue of CISILE   PHI (China) sets up a booth at the exhibition   Technicians explained the functions and characteristics of the instruments

Shenzhen Tsinghua University Open house Seminar was successfully held in the Lecture Hall of Shenzhen Tsinghua University Graduate School from 31st March to 1st April this year. This Open house is mainly organized by the Graduate School of Shenzhen Tsinghua University and co-organized by ULVAC-PHI and PHI (China) Limited. There were around 200 participants who have joined the Open house. The participants were not only from the teachers and students of Tsinghua University Graduate School, but also some surface analysis experts from other districts in China.   Shenzhen Tsinghua University Open House Seminar was like a combination of ‘Seminar’ and ‘Training’. In the seminar part, Scientist of ULVAC-PHI Dr. Chang Hsunyun was one of the guests to present the latest techniques and applications of surface analysis in order to let the participants to have deeper understandings on the information and applicable areas of surface analysis instruments. For the training part, Executive Director of PHI (China) Mr. Wensly Yip was another guest to have a sharing on the data analysis of XPS. He also talked about packaging by XPS, peak-differentiating and imitating, in-depth analysis and imaging processing methods. Besides, Professor Zhang and Mr. Yip have provided technical consultations to all the participants. Both of them have explained and presented the functions and characteristics of XPS to the experts and professors. They answered their questions one by one and enhanced the understandings in XPS in terms of the wide range of possible applications.   There is a booth at the seminar   Scientist of ULVAC-PHI Dr. Chang Hsunyun had given a talk to the audiences   Executive Director of PHI (China) Mr. Wensly Yip had given a talk to the audiences

(This page is in Chinese only.  For details, please kindly contact our representative.)   【第一轮通知】  高德公司 邀请函 清华大学深圳研究生院 表面分析技术应用研讨会暨光电子能谱仪培训班   清华大学深圳研究生院于2016年底完成PHI 5000 VersaPrboe-II扫描聚焦型X射线光电子能谱仪器（ULVAC-PHI,Inc.）的安装、调试工作，设备全部功能现已正式对外开放。光电子能谱仪被广泛应用于各类材料的研究中, 包括：有机发光体(OLED)、太阳能电池、锂电池、燃料电池、石墨烯、食品安全等。借助表面分析手段，可实现产品工艺改良和性能提高的目的，尤其光电子能谱(XPS)和紫外光电子能谱(UPS)都提供了材料的关键信息，是不可或缺的研究手段。目前，XPS可实现较高的空间分辨（＜10um）能力，配合团簇离子源的逐层剖析功能可实现多层有机/无机结构材料无损深度分析, 进一步提高了表面分析应用的深度和广度。此外, 配合样品传输管可使样品在真空或惰性气氛下转移和传输，有效地避免样品在转移过程中可能存在的污染。   为增进广大师生对XPS功能的了解，提高对XPS数据分析处理能力，清华大学深圳研究生院材料与器件检测中心将邀请ULVAC-PH原厂工程师及其中国代表公司PHI(China)高德英特(北京)科技有限公司相关工程师，针对该中心现有X射线光电子能谱仪仪器的功能和应用范围,开展一次技术交流活动。本次活动将分为两个主要部分：第一部分将以研讨会的方式进行,邀请ULVAC-PHI原厂科学家对表面分析最新的技术和应用作出讲解，让与会者再一次清楚的了解现今的表面分析工具可以提供怎么样的讯息，以应用在各种研究范畴上；第二部份以培训班进行，目的为提供参会人士如何对光电子能谱的分析数据进行进理、包装定性定量、分峰拟合、深度分析和图像处理的方法。活动详细安排如下:   一、会议时间、地点 会议时间：2017年3月31日 下午2:00 至 6:00  　　　　　2017年4月1日上午 9:00 至 下午 6:00 地点：清华大学深圳研究生院能源与环境大楼报告厅   二、会议安排   2017年3月31日　　 -　环境大楼报告厅 　　　　　　　　　　1:30pm ~ 2:00pm　-　报到时间 　　　　　　　　　　2:00pm ~ 2:10pm　-　研讨会开场, 领导致辞 　　　　　　　　　　2:10pm ~ 2:50pm　-　XPS 的多种应用讨论叶上远 (PHI China) 　　　　　　　　　　2:50pm ~ 3:30pm　-　ULVAC-PHI 科学家应用讨论报告 (ULVAC-PHI) 　　　　　　　　　　3:30pm ~ 4:00pm　-　小息时间, 仪器参观 　　　　　　　　　　4:00pm ~ 4:30pm　-　ULVAC-PHI 科学家 XPS 原理 (ULVAC-PHI) 　　　　　　　　　　4:30pm ~ 5:30pm　-　Live Demo 实时分析演示和讨论 5:30pm ~ 6:00pm　-　Q & A   2017年4月1日　　 -　环境大楼报告厅 　　　　　　　　　　9:00am ~ 10:15am　-　全谱/窄谱, 峰较正, 定性/定量分析, 灵敏因子 　　　　　　　　　　10:15am ~12 noon　-　分峰拟合, 峰形, 峰背景概念 　　　　　　　　　　1:30pm ~ 3:00pm　 -　分峰拟合复杂案例分析 　　　　　　　　　　3:00pm ~ 3:30pm 　-　小息时间 　　　　　　　　　　3:30pm ~ 5:00pm　 -　深度分析, 线扫瞄, 面扫瞄影像数据处理 　　　　　　　　　　5:00pm ~ 6:00pm　 -　Q & A   三、会议报名与收费                                研讨会会议免费。请以以下格式报名, 将报名信息填妥后发送邮件至: geng.huanran@sz.tsinghua.edu.cn 或电话联络：耿焕然: +86-15019479017 （0755-26036417）   参会人姓名： 单位名称： 联系电话：   (注：为合理安排会场，请大家提前报名，报名截止日期为2017年3月27日)。   高德英特（北京）科技有限公司 ULVAC-PHI Incorporated